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Novel approaches for halogen-free and sustainable etching of Silicon and Glass

Novel approaches for halogen-free and sustainable etching of Silicon and Glass

Novel approaches for halogen-free and sustainable etching of Silicon and Glass

Novel approaches for halogen-free and sustainable etching of Silicon and Glass

Sustainable Semiconductor Manufacturing

The HaloFreeEtch project is framed within the broader context of sustainable development and the European Union’s commitment to reducing environmental impact across various industries.

Project

HaloFreeEtch aims to revolutionize semiconductor manufacturing by developing an environmentally sustainable etching process that eliminates the use of halogenated compounds

Objectives

The primary objective of the HaloFreeEtch project is to develop and implement a halogen-free etching process for semiconductor manufacturing

Impacts

The HaloFreeEtch project is poised to have a substantial impact on both the semiconductor industry and the environment. The project will contribute to reducing the ecological footprint of semiconductor manufacturing

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Jörg Schuster
Jörg SchusterProject Coordinator
Isella Vicini
Isella ViciniDissemination Manager

Project Details

Project number: 101161153
Project name: Novel approaches for halogen-free and sustainable etching of Silicon and Glass
Project acronym: HaloFreeEtch
Topic: HORIZON-EIC-2023-PATHFINDERCHALLENGES-01-04
Type of action: HORIZON-EIC
Project starting date: 1 September 2024
Project duration: 48 months
EU Contribution: 3.997.735,00 Euro

“Funded by the European Union. Views and opinions expressed are however those of the author(s) only and do not necessarily reflect those of European Innovation Council and SMEs Executive Agency (EISMEA). Neither the European Union nor the granting authority can be held responsible for them.”

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