CONCEPT

Background

The HaloFreeEtch project is framed within the broader context of sustainable development and the European Union’s commitment to reducing environmental impact across various industries. This project aligns with the EU’s Green Deal objectives, which aim to achieve climate neutrality by 2050.

HaloFreeEtch focuses specifically on the semiconductor industry, addressing the urgent need for greener manufacturing processes. The project’s framework incorporates interdisciplinary research, cutting-edge technological innovation, and strong industry-academia collaboration. By adhering to these principles, HaloFreeEtch not only aims to deliver tangible environmental benefits but also to set new standards in the industry, demonstrating that high-tech manufacturing can be both sustainable and economically viable.

The project’s structured approach ensures that each phase, from research and development to implementation and dissemination, is meticulously planned and executed to maximize impact and achieve its ambitious goals.

ABOUT HALOFREEETCH

Project

The HaloFreeEtch project aims to revolutionize semiconductor manufacturing by developing an environmentally sustainable etching process that eliminates the use of halogenated compounds.

Funded by the European Union, this innovative initiative brings together leading experts from academia, research institutions, and industry to address the critical need for greener manufacturing technologies. By leveraging cutting-edge plasma etching techniques and advanced materials science, HaloFreeEtch strives to reduce the environmental footprint of semiconductor production while maintaining high performance and cost-effectiveness.

The project’s interdisciplinary consortium ensures a holistic approach, fostering collaboration and knowledge exchange across different fields.

innovation technology

Objectives

Innovation in Etching Technology

Creating novel etching processes that replace harmful halogenated compounds with environmentally friendly alternatives.

Sustainability

Significantly reducing the environmental impact of semiconductor manufacturing by minimizing hazardous waste and lowering energy consumption.

High Performance

Ensuring that the new etching techniques meet or exceed the performance standards of current technologies, without compromising on quality or efficiency.

Scalability

Developing scalable solutions that can be easily integrated into existing manufacturing workflows and adopted by the semiconductor industry at large.

Cost-effectiveness

This means optimizing the production techniques to reduce costs and make the adoption of these greener technologies financially viable for semiconductor manufacturers.

Knowledge Transfer

By promoting knowledge exchange and joint development efforts, the project aims to accelerate the adoption of innovative technologies and ensure that the latest advancements are quickly translated into practical applications.

Regulatory Compliance

Ensuring that the new etching processes comply with current and future environmental regulations. This proactive approach will help semiconductor manufacturers stay ahead of regulatory changes and avoid potential compliance issues.

Educational Outreach

Part of the project’s objective is to educate and train the next generation of scientists and engineers in sustainable manufacturing practices. This involves developing educational materials, organizing workshops, and creating opportunities for hands-on learning experiences.

Market Readiness

Preparing the new technologies for market entry by conducting thorough testing, validation, and optimization. This step is crucial to ensure that the halogen-free etching processes are ready for large-scale adoption and can be seamlessly integrated into existing production lines.