HaloFreeEtch General Assembly – Month 6: Progress & Next Steps

March 5-6 2025. Six months into the HaloFreeEtch project, partners gathered at Vrije Universiteit Brussel (VUB) for the General Assembly, marking a key milestone to evaluate progress and define the next strategic steps.

Work Package leaders presented the latest advancements in halogen-free etching technology, emphasizing its potential impact on sustainable semiconductor manufacturing.
Discussions centered around upcoming milestones, dissemination strategies, and technical challenges, ensuring efficient collaboration across the consortium.
The meeting provided a platform for in-depth discussions on upcoming technical milestones, dissemination strategies, and key challenges, ensuring seamless coordination across the consortium.

Strengthening collaboration among partners was a focal point, fostering synergies that will drive innovation forward.

The next General Assembly will take place in Brno (October 2025), hosted by PlasmaSolve, where partners will refine their research directions and collaborative efforts.

HaloFreeEtch remains dedicated to driving innovation and sustainability in the semiconductor industry.

HaloFreeEtch Consortium at General Assembly Month 6
HaloFreeEtch Partners at General Assembly Month 6
MicoLab at VUB
HaloFreeEtch Partners at General Assembly Month 6 visiting MicoLab at VUB
MicoLab at VUB
HaloFreeEtch Partners at General Assembly Month 6
HaloFreeEtch Partners at General Assembly Month 6
Rossella Urgnani WH HaloFreeEtch Exploitation Manager presents at General Assembly Month 6
MicoLab at VUB
MicoLab at VUB
HaloFreeEtch Partners at General Assembly Month 6
Cristina Schiavi WH HaloFreeEtch Dissemination & Communication Rep. presents at General Assembly Month 6
HaloFreeEtch Partners at General Assembly Month 6
HaloFreeEtch IAB at General Assembly Month 6
Giulia Mora, WH HaloFreeEtch Project Manager, presents at General Assembly Month 6
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