The HaloFreeEtch project was proudly presented at the Plasma Etch & Strip in Microtechnology (PESM 2025) conference, held on June 16–17, 2025 at Fraunhofer ENAS in Chemnitz, Germany. PESM 2025 is an international platform that brings together leading experts, researchers, and industry stakeholders to discuss the latest developments in plasma etching and stripping processes for
HaloFreeEtch General Assembly – Month 6: Progress & Next Steps March 5-6 2025. Six months into the HaloFreeEtch project, partners gathered at Vrije Universiteit Brussel (VUB) for the General Assembly, marking a key milestone to evaluate progress and define the next strategic steps. Work Package leaders presented the latest advancements in halogen-free etching technology,
HaloFreeEtch at the 1st EIC Portfolio Meeting: Collaboration for Innovation in Microelectronics On February 18-19, 2025, HaloFreeEtch participated in the 1st In-Person Meeting of the EIC Pathfinder Responsible Electronics Portfolio at TU Eindhoven. This event was a key opportunity to strengthen collaboration among EIC-funded projects and foster synergies in sustainable microelectronics. During the two-day
HaloFreeEtch in the Spotlight: Featured on ORF Online We are thrilled to share that the HaloFreeEtch project has been featured today on ORF Online, the digital platform of Austria's public broadcaster, ORF. This is a significant milestone for our project, as ORF is one of the most respected and widely recognized media outlets in
HaloFreeEtch at Precisiebeurs 2024: Sustainable Innovation in the Spotlight On November 12-13, our partner PlasmaSolve s.r.o. brought HaloFreeEtch to Precisiebeurs 2024, the leading event in the Netherlands for high and ultra-precision technologies. During the exhibition, industry leaders, experts, and professionals had the opportunity to discover our innovative sustainable etching solution, which combines efficiency, cutting-edge
The HaloFreeEtch Project Kicks Off with the Consortium's Kick-Off Meeting On September 18, 2024, the Kick-Off Meeting of the HaloFreeEtch consortium was held at Technische Universität Chemnitz in Germany, marking the official start of this innovative project funded by the European Union. Coordinated by Jörg Schuster, HaloFreeEtch aims to develop sustainable and halogen-free etching
