The HaloFreeEtch Project Kicks Off with the Consortium’s Kick-Off Meeting
On September 18, 2024, the Kick-Off Meeting of the HaloFreeEtch consortium was held at Technische Universität Chemnitz in Germany, marking the official start of this innovative project funded by the European Union. Coordinated by Jörg Schuster, HaloFreeEtch aims to develop sustainable and halogen-free etching processes for the semiconductor sector, reducing the environmental impact of current manufacturing technologies.
During the meeting, representatives from the seven consortium partners, including research institutions and companies from various European countries, discussed the project’s organization, decision-making structures, and the first steps of the Work Packages (WPs). The meeting agenda included introductory presentations, discussions on roles and responsibilities within the project, and a tour of the university’s laboratories.
The Kick-Off Meeting was a crucial moment to establish the foundations of the consortium’s collaborative work and set the guidelines for achieving the ambitious goals of the project, which will run for 48 months and receive a contribution of approximately 4 million euros from the European Union
