HaloFreeEtch in the Spotlight: Featured on ORF Online

We are thrilled to share that the HaloFreeEtch project has been featured today on ORF Online, the digital platform of Austria’s public broadcaster, ORF. This is a significant milestone for our project, as ORF is one of the most respected and widely recognized media outlets in Austria, ensuring that our vision and objectives reach a broad audience.

The article highlights the innovative goals of HaloFreeEtch in developing halogen-free and sustainable etching processes for silicon and glass, underlining the project’s potential impact on both the semiconductor industry and environmental sustainability.

This media coverage represents an excellent opportunity to increase public awareness of the project and foster interest among stakeholders, industry leaders, and researchers across Europe.

You can read the full article in German here.

We would like to thank ORF for featuring HaloFreeEtch and bringing attention to our efforts to revolutionize etching technologies through sustainability and innovation. Stay tuned for more updates on our progress and achievements!