The HaloFreeEtch project was proudly presented at the Plasma Etch & Strip in Microtechnology (PESM 2025) conference, held on June 16–17, 2025 at Fraunhofer ENAS in Chemnitz, Germany.

PESM 2025 is an international platform that brings together leading experts, researchers, and industry stakeholders to discuss the latest developments in plasma etching and stripping processes for micro- and nanofabrication.

During the event, the HaloFreeEtch team showcased the project’s mission to develop halogen-free etching technologies, addressing the urgent need for more sustainable, safe, and environmentally friendly alternatives in the semiconductor industry.

Our participation at PESM 2025 was an excellent opportunity to:

• Present the project’s objectives and expected impact.

• Exchange knowledge with the scientific and industrial community.

• Strengthen collaborations and raise awareness of HaloFreeEtch’s innovative approach.

Stay tuned for more updates as we continue to drive innovation towards greener and safer plasma etching solutions!

🔗 Learn more about the event: PESM 2025 – Fraunhofer ENAS

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