Brno, Czech Republic — HaloFreeEtch Month 12 General Assembly & Review Meeting

On 21–22 October 2025, the HaloFreeEtch consortium gathered in Brno, Czech Republic, kindly hosted by project partner PlasmaSolve, for the Month 12 General Assembly.

During the two-day meeting, partners reviewed the technical and scientific progress achieved in the first year of the project. Each Work Package presented its key results, milestones, and ongoing activities, highlighting the steady advancement toward the project’s objectives. The discussions also focused on upcoming challenges and next steps to ensure continued alignment across all research and development areas.

The following week, on Monday 27 October, the Review Meeting took place with representatives of the European Commission. The reviewers expressed positive feedback, recognizing the strong collaboration and effective teamwork within the consortium and confirming that HaloFreeEtch is progressing successfully towards its scientific and technological goals.

The first year marks an important milestone for HaloFreeEtch, demonstrating how close collaboration, innovation, and shared commitment are driving the project toward greener, more sustainable semiconductor manufacturing.